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Ion Implantation and Synthesis of Materials PDF

273 Pages·2006·5.218 MB·English
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by Nastasi M., Mayer J.W.| 2006| 273 pages| 5.218| English

About Ion Implantation and Synthesis of Materials

Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Detailed Information

Author:Nastasi M., Mayer J.W.
Publication Year:2006
Pages:273
Language:English
File Size:5.218
Format:PDF
Price:FREE
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