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About 6C - Chemo-Mechanical Polishing (CMP)
Chemical mechanical polishing (CMP) is a process that uses both chemical and mechanical forces to smooth surfaces. It involves using a slurry and polishing pad to remove material from a wafer in a flat and even manner. CMP is primarily used in the integrated circuits industry to planarize insulating and conductive layers. It allows for the fabrication of multilayered semiconductor devices and the removal of excess metal in integrated circuits. Some limitations of CMP include a lack of defined end points and potential defects introduced during polishing.
Detailed Information
| Author: | ['HARSHVARDHAN SINGH RATHORE'] |
|---|---|
| Publication Year: | 2023 |
| Pages: | 5 |
| Language: | English |
| Format: | |
| Price: | FREE |
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