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About Icrosystems Ngineering: Dr.-Ing. Ronny Gerbach
The document discusses dry etching techniques used in microsystems engineering. It begins with an overview of reactive ion etching (RIE), noting that it uses both chemical etching and ion bombardment to achieve high selectivity and anisotropy. Deep RIE (DRIE) is then introduced, which alternates between etching and passivation steps to achieve high etch depths and rates. Various effects that can occur during DRIE are described, such as trench widening, notch formation, and loading effects. The lecture outline and an overview of the semiconductor manufacturing process are also provided.
Detailed Information
| Author: | ['Rahul Reddy'] |
|---|---|
| Publication Year: | 2018 |
| Pages: | 28 |
| Language: | English |
| Format: | |
| Price: | FREE |
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